Product Description
1. High temperature resistance: The melting point of quartz (SiO₂) is about 1700°C. It can work stably for a long time in a high temperature environment of 1200°C~1600°C without softening or deformation.
2. Thermal stability: The thermal expansion coefficient is extremely low (about 0.5×10⁻⁶/°C), the thermal shock resistance is strong, and it can withstand the rapid heating and cooling process of molten glass.
3. Chemical inertness: It does not react with molten glass, metal or corrosive gas to avoid contaminating the material composition. It is especially suitable for high-purity glass (such as optical glass, photovoltaic glass) or semiconductor material melting.
4. Mechanical properties: It still maintains high hardness and bending strength at high temperature, suitable for high-speed stirring or complex flow field environment.
1. Optical glass melting: ensure the uniformity of rare earth doped glass and avoid refractive index fluctuations.
2. Electronic glass manufacturing: such as high-precision stirring requirements for liquid crystal substrate glass and cover glass.
3. Utensil glass production: eliminate defects such as streaks and stones to improve the light transmittance of finished products.
4. Preparation of special materials: such as quartz glass melting, high-temperature alloy melting, and single crystal silicon pulling auxiliary stirring.
